No, you can't. Cu will quickly by oxidized in PECVD chamber. And you will find Cu/SiN cracked and peels off. > Yes. You can. SiN layer can be used as Cu diffusion layer. > > ----- Original Message ----- > *From:* "Xiaoding wei"> *To:* mems-talk@memsnet.org > *Sent:* 04 April 2006 03:46:34 > *Subject:* [mems-talk] Growing SiN on copper film using PECVD? > > >> Hi, Does anyone know if I can grow a SiN layer on copper film using >> PECVD method? > >