Hi,
I tried same thing with 500nm PECVD nitride at 100oC of KOH, but there was
no problem. Maybe your thickness is too thin. However there are a lot of
pinhole in PE nitride from which the KOH solution penetrate thru, so you'de
better use LP nitride.

Jeehwan

-----Original Message-----
From: mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org]
On Behalf Of Ziaur Rahman
Sent: Monday, May 01, 2006 3:04 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] PECVD Silicon Nitride Recipe for KOH etching

Hello,

  I used PECVD Silicon Nitride as a mask to etch silicon
  using KOH solution. But the silicon nitride film peeled off
  when I put the wafer in KOH solution (44% weight at 85 C).

  If I anneal the silicon nitride film will it work? Can anyone give
  me a good recipe for PECVD Silicon Nitride which will work as
  mask for KOH etching?