Scott,
         I am travelling at the moment.  When I return i wil try to =
answer more.  Scott Barnes did a great paper on holographic exposure =
using a Karl Suss aligner and image reversal.  He was able to define 0.1 =
micron dimensions down the side walls of a 10 deep micron trench wall.  =
I will try to find Scott when I return next week and get him in contact =
with you.  Bil Moffat, Yield Engineering Systems.

________________________________

From: mems-talk-bounces@memsnet.org on behalf of =
smcwilliams@photodigm.com
Sent: Thu 5/4/2006 11:38 AM
To: mems-talk@memsnet.org
Subject: [mems-talk] DUV resist for holographic gratings



I am planning on using the 244nm line from a frequency doubled argon =
laser
and would like to know what DUV photoresist is typically used for
holographic gratings.  Because of existing topography it is desirable to =
use
resist thickness of about 100 nm or less.

Thanks in advance for your help,

Scott