Hi Yu,

You can use UV Ozone exposure through shadow mask (if your feature size is
not too small) or Lift-off scheme (pattern photoresist first, then deposit
MPTS, and finally dissolve photoresist with acetone).


Boris Kobrin, Ph.D.
Director of Technology
Applied Microstructures, Inc.
1020 Rincon Circle, San Jose, CA 95131
(408) 907-2885 x2805 office
(408) 594-0654 mobile
boris_kobrin@appliedmst.com


Message: 3
Date: Wed, 10 May 2006 15:38:25 -0400
From: cyyfq@bu.edu
Subject: [mems-talk] MPTS modified surface
To: mems-talk@memsnet.org
Message-ID: <20060510153825.oc1g3qklt44ososc@www.bu.edu>
Content-Type: text/plain;       charset=ISO-8859-1;     format="flowed"

Hello all,

I have some questions about mercapto silane.

after modified silicon surface with MPTS(mercapto silane),
if I do these things on the sample,is the sueface character going to change?

1.spin PMMA.
2.do e-beam lithography.
3.develope with MIBK in IPA.

which means, whether the surface can still be used to bind biotin, etc.?

if you know any step above is going to destroy the mercapto silane,
please let me know.

same question to the surface further modified by biotin.


best

Yu Chen