Hello,

I want to strip 1um positive photoresist (OCG 825) after BOE
patterning of oxide coated 2 inch GaAs wafers. I have tried a 1 hour
barrel ash at 1000W but there still seems to be some stubborn resist
adhering to the oxide. I understand that piranha might hurt the GaAs
wafers. Can anyone please advise a GaAs compatible wet chemical etch
for stripping the residual Photoresist.

Thank you.
Regards

Kamesh
Graduate Student
MIT
Cambrige,MA