Use aqua regia: 3 HCl: 1 HNO3 at ~80C. You might first try this at room
temperature.

-Mike Martin
  U. of Louisville

>>> jhkim03@ucla.edu 06/22/06 4:51 PM >>>
Dear colleagues,

I will use the Pt to protect my Si wafer surface for anodization. Is
there
any one who has a recipe for removing Pt without attacking Si surface?