Kim,
Fluorine is not used to make SiN it is used to clean the chamber. PECVD
amorphous silicon recipe with nitrogen or ammonia should do the trick.

P.S. A target index of refraction at 632nm will help if you need to have
someone make this for you.

Best Regards,
Glenn Silveira

-----Original Message-----
From: K Saw [mailto:K.Saw@mail.aip.org.au]
Sent: Sunday, July 23, 2006 7:23 PM
To: mems-talk@memsnet.org
Cc: mems-talk-request@memsnet.org
Subject: [mems-talk] silicon nitridation poser


Dear All,

I would like to know how I can obtain a nitrided Si layer on a Si wafer.
The top overlayer of SiN should about 2 or 3 micron. Is fluorine used in
the process?

Thanks.

Kim

k.saw@aip.org.au