Kim,
May be, you could try CVD to deposit the film
bhat
 Quoting Glenn Silveira :

> Kim,
> Fluorine is not used to make SiN it is used to clean the chamber. PECVD
> amorphous silicon recipe with nitrogen or ammonia should do the trick.
>
> P.S. A target index of refraction at 632nm will help if you need to have
> someone make this for you.