Greetings,
did you consider micro/photo machining technology?
the 50 M is no problem 200 M is a bit of a challenge..
for more info you can contact me
engineering@elume.com
kind regards
walter

----- Original Message -----
From: "Kannan Ramaraj" 
To: 
Sent: Tuesday, August 29, 2006 3:51 AM
Subject: [mems-talk] Regarding Glass lithography


> Hi all!
>    I am trying to make one-dimensional groove pattern over the glass
> surface with a width and depth ranging from 50micron to 200 micron. I
> laminated dry photoresist over the glass surface and prepared the pattern
> in the glass surface. Photoresist is not staying more than 1 minute if i
> put it in dilute HF. And also I read in this site that I can use Chromium
> as a sacrificial layer. But I don't have chromium with me. Can you suggest
> some other material as a sacrificial layer ? Whether I have to coat my
> sacrificial layer before or after the photoresist ? Please give some idea
> to overcome this issue.
>          Thanks!
>                                  With regards,
>                                    R.Kannan
>
>