dear friends,
i am having patterned AL layer on si wafer. In my case, I have to etch si
for 180 micron, but as Al layers is there, i am unable to mask it with Sio2
or Si3n4.
i am using 30wt % KOH at 70-80C as Si etchat.
So please suggest me propable solution in this case.
with regard
abhay joshi,
university of pune
india