Why not just fabricating a Si3N4 thin film by silicon etching ??
It is the simplest one to fabricate by yourself.

Double side coating nitride layers and design a mask to define the geometry that
you want on one side and general photolithography process,and then KOH etching
(100) Si. (nitride doesn't react with KOH; therefore, you can create a nitride
thin film)
I didn't provide the detail process but think that it should be easy to figure
it out.
0.3 um nitride coating is strong enough.


Lung-hao Hu

Graduate Student

Dept.of Mechanical Engineering
Univ.of Colorado Boulder
UCB 427 CO 80309 U.S.A
Email:lung.hu@colorado.edu
Tel:303-786-1702(H)
    303-492-6107(O)
Fax:303-492-3498