Depending upon the photoresist you probably have reflowed and filled in what was
your developed pattern with photoresist thus preventing the HF from etching the
quartz. You probably want to reduce your hard bake time after develop to what is
recommended by the resist vendor you use. They provide excellent documentation
for superior results. Bob Henderson


-----Original Message-----
From: KORTESEB@libero.it
To: mems-talk@memsnet.org
Sent: Thu, 14 Dec 2006 9:10 AM
Subject: [mems-talk] Quartz wet etching


Dear all
I'm wet etching quartz with a BHF solution 6:1, but I have encounterd some
difficulties in etching.
What I do is a photolithographic process on the quartz substrate, a hardbake of
4 hours at 180° and then the wet etching process.
What I obtain though is the rearrangement of the photoresist in a disordered
pattern and no etching!
Has anyone an idea where I go wrong?
Barbara
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