Ravi,
I am not sure about the photoresists you used.  I use AZ5214E and spin it
5000rpm for 30s. It should measure about 1 micron or so.  Then I soft bake the
resist at 95'C for 1min before exposing it at 4.3mW/cm2 for about 9s.
Thereafter I develop it in the AZ Developer for a few seconds.  After the
required metal film is evaporated on the open areas in the resist, the AZ5214E
is stripped off in acetone with slight agitation.

If anybody else has better suggestions to suggest for lift-off, I am all ears.

Mr. Jeffrey Mun Pun YUE
余文彬
Division of Bioengineering
Block E3, #05-18, Nanobioanalytics Lab
9 Engineering Drive 1
National University of Singapore
Singapore 117576
Tel: (65) 65165985, Fax: (65) 68723069
E-mail:  g0500396@nus.edu.sg
Website:  http://www.bioeng.nus.edu.sg/people/trau/Lab_index.htm

-----Original Message-----
From: mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org] On
Behalf Of Ravi Shankar
Sent: Tuesday, January 16, 2007 1:37 AM
To: mems-talk@memsnet.org
Subject: [mems-talk] Lift-off Recipe

Hi all,

   I need to use lift-off process for my device fabrication.. So far
we haven't standardised lift-off process in our lab. We are suing
S1813 and HNR 120 photoresists... Is it possible to achieve lift-off
process with these low thickness photoresists? Can any one suggest
recipe for lift-off process.. suggestions will be highly appreciated.