Dear Lin,

we know the problem of removing PR after RIE very well. Usually we use the
following recipe with CNT and PR (also after RIE) that works pretty well:
place the sample a fwe min into hot acetone (50C), then few hours hot
N-Methyl-2-Pyrrolidon (NMP). This is the basis of most PR. Then hot acetone
again and then Isopropanol.

We could not see any attack of the CNTs by the NMP even if electrically
measuring individual single walled carbon nanotubes.

Hope this helps.

Regards,
Thomas



---
ETH Zurich
Thomas Helbling
Micro and Nanosystems
CLA H 5
Tannenstrasse 3
8092 Zurich, Switzerland

www.micro.mavt.ethz.ch

+41 44 632 25 38 phone
+41 44 632 14 62 fax
-----Original Message-----
From: mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org]
On Behalf Of Lin Yu
Sent: Montag, 29. Januar 2007 17:13
To: mems-talk@memsnet.org
Subject: [mems-talk] How to remove PR in the sample with CNT

Dear all,

I would like to remove positive photoresist after treating sample in RIE.
And I found that it's very difficult to remove the photoresist in acetone.
Then I want to use PRS 2000. But I don't know whether it will attack
the Carbon nanotube in my sample. Does anyone have the experience
or any suggestion about removing PR in the sample with CNT?