In my experience, the refractive index does not change much between
unexposed and exposed photoresist. The thickness of the resist is a bigger
factor. This is why swing curves are used to determine what thickness to
use.

-----Original Message-----
From: mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org]
On Behalf Of Martyn Gadsdon
Sent: Friday, February 09, 2007 8:20 AM
To: mems-talk@memsnet.org
Subject: [mems-talk] Refractive Index of Photoresists

Dear All,

I am interested in finding out what the difference in refractive index is
between un-exposed (with uv radiation) and exposed photoresist. Particularly

I am interested in knowing what photoresist (or other substance that can be
applied by spinning) will give me the most difference in refractive index
between exposed and unexposed areas.