Hi,
I have patterned some gold heaters using lift-off process with AZ5214E resist.
The lift-off was done using AZ5214E resist.  However, I noticed plenty of tiny
resist residue remaining on the wafer after the lift-off process, which cannot
be removed using further acetone wash nor ultrasonic power.  Can anyone tell me
how I can remove this residue to result in a clean wafer?
Thanks.

Jeffrey