Dear all,
Recently we started observing that when we use the RTA in gas flow
ambient(N2 gas), the temperature is not stable. For example, if I ramp
up the temperature to 800'C, the temperature starts to oscillate between
780'C - 820'C during the hold time. This is only observed if I do gas
flow anneal and not in vacuum anneal. Initially we thought its because
the gas flow rate is too high which is causing some turbulence to the
thermocouple (somehow) and so the temperature is not uniform, but even
after keeping the gas flow rate to be as low as possible the problem
persists.
Also, I have tried reducing the temperature ramp rate to as low as
7'C/sec but the effect is the same.
I have tried other annealing temperatures as well. At 700'C, the
oscillation is between 690'C - 720'C and at 600'C, its 597'C - 604'C.
At or below 500'C, the oscillation is neglegible(maybe 1-2'C only) and
the results are fine.

If somebody has any experience in the above problem please do reply back
to me.
The RTA equipment that we have is: ULVAC-MILA-3000-P-N Mini Lamp
Annealer.

Thanks and regards,
Mantavya