Pradeep,
I was told that O2 plasma may damage the structures.  I have tried a combination
of AZ300 Stripper and SC-1 (NH4OH:H2O2:H20 = 1:1:5) clean, which helped to clean
up almost all of the resist residue, although with the H2O2 component, a small
portion of the heaters is damaged.  Nevertheless, this combination cleaned up
the residues significantly.

Jeffrey

________________________________

From: mems-talk-bounces@memsnet.org on behalf of Pradeep Dixit
Sent: Wed 2/28/2007 8:18 PM
To: General MEMS discussion
Subject: Re: [mems-talk] Removal of post-lift-off resist residue

One simple solution is to use O2 plasma for short time to remove these
residue.

Thanks,
Pradeep


On 2/27/07, Yue Mun Pun, Jeffrey  wrote:
>
> Hi,
> I have patterned some gold heaters using lift-off process with AZ5214E
> resist.  The lift-off was done using AZ5214E resist.  However, I noticed
> plenty of tiny resist residue remaining on the wafer after the lift-off
> process, which cannot be removed using further acetone wash nor ultrasonic
> power.  Can anyone tell me how I can remove this residue to result in a
> clean wafer?