Hi;

I am interesting with RIE Etching. I will use CF4+H2 gases. Are there
experienced people with using these gases? I need flow rate  (sccm) and rf
power. Also i would like to know gold etching rate in these gases.


Best Regards.

Tolga YELBOGA
Project Engineer
Nanotechnology Researh Center
Bilkent University
Bilkent, Ankara 06800 TURKEY
Voice: 90-312-290-1020
www.nanotr.bilkent.edu.tr