Hi, WU:

I' d wonder to know what is etcher do you use? while you add HE-O2 to CL2/HBR
base etch gases , the seletivity is good enough to silicon on oxide wafer. the
seletivity  always higer than 50:1.
ÔÚ2007-06-13£¬"Ning Wu (nwu@Princeton.EDU)"
 дµÀ£º
Dear all, I would greatly appreciate if someone can suggest a recipe for
selective RIE etching of silicon over silicon oxide. Any selective ratio > 5 is
fine with me.

Thanks.

Ning Wu
The Department of Chemical Engineering
Princeton University
New Jersey 08544