Hello,

You did not mention what type of resist you have used, without that hard
to say. But you can try with the following protocol for lift off.

*         5-20 min ACETONE SOAK

*         3 - 5 MIN. ACETONE FLUSH WITH SQUEEZE BOTTLE.

*         3 MIN ACETONE SOAK W/ ULTRASONIC.

*         3 MIN. IPA W/ ULTRASONIC.

*         Final Strip: NMP or PRS-1000, at 80 degrees C. or O2 ash.


Alternatively you can try with KoH solution.

Hope it will solve your problem

Regards,

Mamun

-----Original Message-----
From: mems-talk-bounces@memsnet.org
[mailto:mems-talk-bounces@memsnet.org] On Behalf Of Hongzhi CHEN
Sent: 09 July 2007 06:20
To: mems-talk@memsnet.org
Subject: [mems-talk] lift off with PMMA

I am using the e-beam to pattern my sample, the
resulotion is not very high, just around 500nm. It is
followed by depositing metal. After that, I use the
aceton to do the lift-off. My problem is that the
metal did not peel off as expected, after puting my
sample in the aceton for one day, no any metal peel
off. I need to use the ultrasonic to enhence the
lift-off process, after around 30 seconds ultrasonic,
most of the metal peel off. But some metal around the
pattern did not peel off even after around 10 miniutes
ultrasonic.

Is there any other chemical can remove PMMA better
than Aceton? Or is there any other way can enhance
this e-beam lift-off process? I appreciate any advice.