What about the thermal mismatch between mask and substrate. This sounds like an impossibility. -CHM On Fri, 24 Jul 1998, miyazaki wrote: > Dear Dr. mems@ISI.EDU > > Thank you everyone. > > I'm eagerly looking for the high overlay accuracy aligner. > > My R&D is on diffactive optics elements ( DOEs ) making. > I hope to make multi-level ( multi-step ) DOEs with aligner lithography and etching on SiC or other material which can be reactively etched. > > The first , I wish to look the high overlay accuracy aligner or make it with aligner maker. > The specification is <0.01 micron. > > Do you know something on high overlay accuracy aligner machine ? > Please send me some e-mail. > > > > > Best regards, > > NALUX http://www.nalux.co.jp > R&D > Atsushi Miyazaki > E-mail : atushi_m@yo.rim.or.jp > >