Saravan,

Is your system a DC magnetron sputterer?   If so, have you changed your
target's position?  I did that once and the magnet in the other position
was not as strong and I was unable to get a plasma.  Also have you
changed your spacing from your target to your sample?  You should have
some type of ion capture shield around the rim of your target.  Is that
spaced correctly?  And lastly, are you using the same gas pressure as
before?

Brent

saravan kallempudi wrote:
> Dear Members,
>
> I have a problem with my DC sputter. We used to sputter Nickel but we have
strange problem now having plasma inside chamber but unable to sputter nickel. I
thought of target poisoning and I cleaned the target with Nitricacid and then
also I was not able to move forward. Can anyone suggest me in this!