You know the required time is related with your intensity and power of
the UV light. You need to consider the nature of photo resist, thickness
on the photo resist on the wafer, and positively latitude (g line, I
line, h line).
For example, g line (436 nm) (broadband) you need to consider following
things:

G line performance
Depth of the focus
Expose latitude
Does of print and
Resolution

All these varies with the type of photo resist. You need to look through
for the required data from the photo resist manufacturer/supplier.

Hope it helps you.
Regards,


Mamun Rashid
PhD Student
Centre for Nano & Microsystems
University of Teesside
TS1 3BA. U.K
www.mamun.info
+44(0)164 234 2428
________________________________________
-----Original Message-----
From: mems-talk-bounces@memsnet.org
[mailto:mems-talk-bounces@memsnet.org] On Behalf Of Vinodh Murali
Sent: 21 October 2007 20:43
To: mems-talk@memsnet.org
Subject: [mems-talk] Exposure / Dosage rate calculation

Hello All,

Currently I'm writing a paper and a part involves that I do some
calculation on exposure time and dosage rate for a given intensity. I'm
away from my university and am having trouble finding resources to help
me in this calculation.

Please let me know if there are any papers or manuals out there that
would help me calculate the exposure time or dosage rate for a
photolithographic process. I'd appreciate all the help this group can
provide in helping me complete my paper.