Hi all,
i'm looking for a photoresist which will be resistant to HNA etch. My HNA
composition is HF: 2 parts, HNO3: 15 parts, CH3COOH: 5 parts. Etch time is
200 minutes. So this photoresist must be resistant for a long time. Can
someone suggest a photoresist ? I have already tried S1813, but after
about 3 minutes etch it peeled off.

Many thanks and best regards,
Andrea