Hi guys,

I am trying to etch back a Si bulk with KOH to remain a ~10 um thick membrace
wirh an area of 0.5mm x 0.5mm. I am concerned if such a thin membrance with such
a big area is very fragile and if it is achievable. Someone told me such a thin
Si layer is not flexible as a thin nitride layer. Is that true? I appreciate
your advices.

Lawrence