Has anyone had any success etching Chrome using plasmas from CHF3, SF6, O2, or
N2  (or any combination thereof)?

I don't have any good reason to suspect that any of these should work, but I
can't use normal Chlorine plasmas with this device, as the exposed Au I have
restricts which machines I'm permitted to use. I'm currently using wet etching,
but I'd like to reduce the undercutting a bit.

Thanks,

Kevin Paul Nichols
MESA+ Institute for Nanotechnology
Mesoscale Chemical Systems
Meander 151
University of Twente
Postbus 217
7500 AE Enschede
The Netherlands

Office: +31 (0)53 489 26 31
Mobile: +31 (0)6 49 312 471
Fax   : +31 (0)53 489 35 95
Email : k.p.nichols@utwente.nl