Hello,
        I am trying  to fabricate a gold caantilever overhanging on a
trench etched in Si. To make my cantilever stand erect I need to
Planarise the surface. I plan to use thick Oxide to isolate my
cantilever from the substrate hence using Oxide for planarisation is
ruled out. I am thinking of using SOG for planarisation. My querries are
        1. What should be the spin speed to coat SOG to a thickness of
        2-3 microns?
        2. Is it possible to use the same spinner which we use for
        photolithography or a seperate spinner is a must?
        3. What is the max. thickness we can get using SOG?


regards
nk choudhary

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Sqr Ldr N K Choudhary
M.Tech (II).Electrical Engg.
Microelectronics.
IIT Powai.
Bombay- 400 076.
email:  
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