Not too many,  why not use CF4 plasma.

Bill Moffat, CEO
Yield Engineering Systems, Inc.
203-A Lawrence Drive, Livermore, CA  94551-5152
(925) 373-8353

bmoffat@yieldengineering.com

www.yieldengineering.com


-----Original Message-----
From: mems-talk-bounces@memsnet.org
[mailto:mems-talk-bounces@memsnet.org] On Behalf Of Sandip Agarwal
Sent: Tuesday, January 08, 2008 7:49 AM
To: mems-talk@memsnet.org
Subject: [mems-talk] Etching silicon nitride

I want to pattern silicon nitride by etching with hot phosphoric acid.
What are the photoresists that would withstand these etching conditions?