Hi Bill,

  Thanks for your response.

  My device has very sharp Si field emitter tips with ~150A radius. Using RIE
descum with O2 gas might damage the Si tips due to ion or radical bombardment.
Do you have any comment about this?
  Thanks.

  Lawrence


Bill Moffat  »¡¡G
  What is your device concern? Modern plasma cleaners have electron free
plasma that can safely and gently etch organics with no ESD and minimal
change if temperature.