Hi, all

Always got question on microfabrication.

This one is, I use AZ5214 to pattern a OTS (a silane to modify Si
surface) at the the bottom of my SU-8 microchannel. After that, I need
to clean all AZ PR off from SU-8 channel without any damage to SU-8
and OTS layer at bottom, as well as a Cr/Au layer.

I heard the acetone will swell the SU-8, so this is not the right
chemical I can use because it will destroy my critical pattern made by
SU-8.

RIE descum also not a good idea, as it will remove the OTS layer too.

So, which chemical or process I can use to clean the photoresist clearly?

Thanks and regards,
Steven