What is the wafer orientation ?
Best regards,
Andrea

> I read the article write by B. Schwartz and H. Robbins with purpose to
> find the best process to smooth the wafer suface.
>   After few experiments  to my  surprise   I found out that this
> composition (that isn't written in the article):
>                                                  98% HNO3 ( 70%) and 2 %
> HF ( 48.5%)
>   gives a more smooth surface than the compositions in the article.
>
>   I choose this composition because of it the slowly etching rate - 0.6
> micron / minute
>   But the surface  smooth result is not enough  for me . I still  see the
> micro rounds holes on the surface.
>
>   Do you have any better proccess ? Thank you
>