My guess would be it's always possible to ion bombard those away? Just
try Ar and tune the bias. Be careful the PMMA lasts longer than the
film.

If the film is really thin, I don't see the reason to go to Deep RIE.

On Sat, Apr 12, 2008 at 3:40 AM, Ahmet Varilci  wrote:
> Hi
>  I am using e-beam litography to make holes on PMMA then I need to etch holes
on BiSrCaCuO and YBaCuO thin film.
>  Do anyone know if I can etch 100 nm holes on the BiSrCaCuO and YBaCuO thin
film by RIE?
>  or which method could give better performance for that?
>  Thanks
>  Ahmet

* Zou Jie (Jay)
* Department of Physics
* University of Florida
* Tel: +1-352-846-8018
* Email: zoujiepku@gmail.com
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