Leaving in developer 1min longer after pattern is developed could cause
positive wall profile. I would cut that time down to 15 sec, no more.
Everything else looks fine in your process.

Elina Kasman

Process Development Engineer, R&D
Engis Corporation
Phone: 1(847) 484-7225
E-mail: ekasman@engis.com

-----Original Message-----
From: Ad Hall [mailto:ahall@starcryo.com]
Sent: Monday, April 28, 2008 11:20 AM
To: 'General MEMS discussion'
Subject: Re: [mems-talk] positive tone in AZ5214E image reversal process

Here are process conditions that work to give me a negative tone
profile:

Bake 1:30 100c
Coat 4000 rpm 30 sec
Bake 1:30 100c
Expose 1.9sec at 15.6 MW/cm2
Bake 1:30 118c
Cool slowly (1min)
Expose 60 sec at 15.6 MW/cm2
Develop 40 sec AZ917