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     Jason, if you do a search on "SC-1" and "SC-2", you'll probably have
     better luck (SC = standard clean).

     If organic contamination is your concern, then you may also want to
     look at UV-ozone cleaning, which removes organics at least as well as
     SC-1 and SC-2, and it is a dry cleaning method.  Both methods are
     described in "Handbook of Semiconductor Wafer Cleaning Technology -
     Science, Technology and Applications," edited by Werner Kern, Noyes
     Publications, 1993.

     In simplest terms, in the UV-ozone method, short wavelength UV
     generates atomic oxygen and excites or dissociates the organic
     molecules which react with the atomic oxygen.  The results are CO2,
     water, and other light molecules that desorb.

     ..............John.


>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>
O         John R. Vig, Ph.D.
O         U. S. Army Communications-Electronics Command
O         Attn: AMSEL-RD-C2-TP
O         Ft. Monmouth, NJ 07703-5602, U.S.A.
O Telephone: 732-427-4275,  FAX: 732-427-4805
O E-mail:      J.Vig@IEEE.org
> >>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>




______________________________ Reply Separator _________________________________
Subject: RCA Etch??
Author:  Jason Tauscher  at Internet_Gateway
Date:    8/24/98 9:33 AM



Someone mentioned a solution used to clean off Organic contaminants
called RCA Etch or something similar.  It was developed in the 70's or
earlier, but I can't find any literature on it.  I believe that it
contains H2O2 and H2SO4 but I don't know in what proportions.  If anyone
can help  me out, I'd appreciate it.
 We're having some problems with "sticking" of our capacitive
accelerometers and want to eliminate the possibility of organic
contaminants.  Any suggestions would be appreciated.

Thanks.

Jason Tauscher


Jason@sdi.wa.com

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From: Jason Tauscher 
Subject: RCA Etch??
Date: Mon, 24 Aug 98 09:33:00 PDT
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