Good morning,

I have searched for all reponse of sputtering Al/TiW but they didn't satisfied
me. I need a membrane of Al 0.5um/ TiW 0.2 um. For TiW, I use sputtering 250W,
30mtorr and it work well with the PMMA but with alluminium, we use 500W 6mtorr
and it does't work well. The PR cracks too much.
 Could you please give me some information of Al sputtering? And how to deal
with the PR. We cool the substrate at 6°C, is it enough?

Thank you very much for any help.

Kim-Anh BUI-THI
Stagiaire de Thalès Recherche et Technologie
91767 - Palaiseau Cedex
Portable : + 33 6 37 955 998