durusmail: mems-talk: PR residue after CF4 RIE
PR residue after CF4 RIE
2008-07-01
2008-07-01
2008-07-01
2008-07-01
PR residue after CF4 RIE
basar bolukbas
2008-07-01
Piranha Solution (H2SO4:H2O2/3:1) eats any organic based patterns on your
sample. (resist residue, dielectric layer, polyimide etc...)

You can use this solution for residues but in order to protect other patterns
from possible attacks, you should try on dummies first.
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