You might have either some stray light in the lab that exposes the top layer
of the resist or some chemical fumes that might have the same effect (HMDS?)

Shay

-----Original Message-----
From: mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org]
On Behalf Of Jaibir sharma
Sent: Tuesday, September 16, 2008 6:26 PM
To: General MEMS discussion
Subject: Re: [mems-talk] negative resist peeling problem

I feel you can check the expiry date of NPR.

On Tue, 16 Sep 2008 Javier Crespo wrote :
>Dear all,
>
>I'm having a problem with the negative resist developing. I'm using the
same process as always, but from 2 months ago I am having a problem of
resist peeling when  developing. I mean, the resist is completely stocked to
the substrate, but it seems that a little upper layer of resist goes out
forming some wires of resist. These wires during the development process can
stick to other substrates. I have checked the softbaking temperature, the
spinner, the exposure machine and different lots of resist and developer and
I didn't find any solution.
>
>The resist I am using is SC from Fujifilm (5 microns layer).
>
>Could anyone tell me what I can try?