Dear All:

I am trying to etch SiO2 on top of a Cr pillar. Actualy the SiO2 is a
passivation layer and I wanna open a via on top of the Cr pillar. I used CF4 and
Oxygen. After that I found the resistance is too large. Is it possible for Cr to
form some resistive chemicals after this process?

Thanks a lot.

Probably I would try CHF3 but now it is not available.

thank you for your time

shane