thanks,
The channel was transparent and patterns of seives was opaque arcs which
located in the channel. That is to say, by using SU-8, the channel patterns
was a positive mold and with a very small holes (the seives). Our obstacle
was how to make the holes thoughly from top to bottom? The unefficient
development or unefficient exposure? I am not sure if I explain it clear.
Now, we still working on it. We tried different exposure time but cannot
solve such a problem.
the exposure dosage we tried was: 400mJ/cm2, 200mJ/cm2, 100mJ/cm2, 50mJ/cm2,
but no one works. could any one help me? Thanks.



2008/10/28 Gareth Jenkins 

> Insufficient development does sound likely. 3 - 4 mins may not be
> enough especially for your structure.
>
> A well enough exposed/crosslinked structure should withstand the
> developer for much longer periods than the suggested datasheet times.
> I also find putting in fresh developer after the IPA rinse helps
> remove partially exposed resist.
>

--
赵亮
南京大学化学化工学院
Liang Zhao
School of Chemistry and Chemical Engineering, Nanjing University