Hi Hyunchul,

What exposure tool are you using, stepper or mask aligner? If mask aligner, in
what exposure mode are you working? Contact, proximity? Maskaligner in contact
mode should allow to open 3 µm vias. However, i-line is not the best choice for
this task, due to the relatively high absorption of AZ9260 at 365 nm. Try
broadband.

Marc Hennemeyer
_________________________________
Application Engineer
SUSS MicroTec Lithography GmbH



-----Original Message-----
From: mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org] On
Behalf Of Hyun C Jung
Sent: Tuesday, December 02, 2008 9:05 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] AZ 9260

This is my parameters for AZ 9260.

1. Spin coat AZ 9260 at 3000 rpm for 1 min.
2. Soft bake for 90s
3. Expose 15s i-line4
4. Develop 3 min in AZ 400k 1:4