Hyun,

We need more information before we can begin to make a diagnosis.  Can you
provide the following?


  - Wafer type, size and material at the interface layer
  - Coating process details
  - Exposure details (system, pertinent parameters)
  - Develop process details

I can tell you that if you are using a proximity aligner the theoretical optical
limit is 4.7 µm features in a 10 µm film with a 20 µm separation gap between the
mask and the resist with an i-line illumination source.  You would need to
decrease this gap to roughly 6 µm to get to 3.0 µm resolution capabilities.


Best Regards,
Garrett Oakes

EV Group
invent * innovate * implement
Regional Sales Manager North America - Direct: +1 (480) 305 2443, Main: +1 (480)
305 2400 Fax: +1 (480) 305 2401
Cell: +1 (480) 516 6724
E-Mail: G.Oakes@EVGroup.com, Web: www.EVGroup.com

-----Original Message-----
From: Hyun C Jung [mailto:jungh@ece.osu.edu]
Sent: Tuesday, December 02, 2008 11:27 AM
To: mems-talk@memsnet.org
Subject: [mems-talk] AZ 9260

Hello All:

I am trying to pattern 3um diameter circle arrays on AZ 9260 10um thickness but
I am having hard time to open the patterns.
Has anyone tried to open similar patten size on 10um AZ 9260?
I am also looking for data sheet of AZ 9260. I will really appreciate if one of
you guys email me that.
Thanks.

Hyunchul