Hi,

What kind of photoresist you want to etch?
I did RIE with O2-N2 300W, Pressure ~300mTorr, the flow ~40
It etch SPR220 or PR1827 pretty fast. ~0.2-0.4um/min.
For 4.5um of cured PI2611, it takes ~7min to etch through.

Hope it can help a little.

Good luck!