Hi all,

i need to deposit and pattern 4um of SiO2 on germanium.
Some questions:
1) is it possible to deposit SiO2 on germanium ?
2) is it possible to achieve so thick layers ?
3) is it possible to pattern so thick layers ?

About point 3: i have the possibility to pattern SiO2 with BOE solutions
and S1813 photoresist, but i'm afraid that the photoresist will not
withstand the so long needed etch time.

Best regards,
Andrea