Hi
We are going to start using F2 (F2 5% /Ar 95%) as etchant gas and I was
wondering if anybody is familiar with F2 scrubbing methods.

I have set up a small etching chamber and I use activated carbon as filter
located between chamber and pump. However scrubbing efficiency of activated
carbon is low and so I would appreciate if anyone can tell us other ways to
scrub F2 gas.

thanks a lot