I was wondering if anybody has used MaN 2403 (negative tone ebeam resist) as
etch mask for etching Silicon. If you have a recipe, please let me know.
Also, we do not have SF6 in our system. The gases available are Argon,
Oxygen, Chlorine, BCl3,CHF3, C2F4 and few other fluoranes (organic
fluorides). If anybody has etched Silicon using any combination of these
gases with MaN 2403 as mask, please let me know the selectivity and etch
depth.

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Ananth Krishnan
Texas, USA