I am learning to use the 1510 Ultrasonic cleaner to clean photoresist
residue after lift-off with 3000PY resist and after patterning with 1813
resist.  I understand that the wafers have to be placed inside a beaker and
the beaker inside a different solution inside the cleaner.  I would like to
know what solutions are used to clean either 3000PY or 1813 (solution inside
beaker) and what solution goes inside the cleaner.

Thanks,

EVELYN BENABE
Graduate Research Assistant
RF Microsystems Research Group
University of South Florida
4202 East Fowler Avenue
Tampa, FL 33620
Office: ENB 412
Office Phone: (813)-974-4851
Email: benabe@mail.usf.edu