Evelyn,

I don't think Shipley publishes a recommended hard bake time (at least I didn't
see one when I just glanced at their datasheet).

I use 20 min at 120 C. That works for my application, but there's a lot of
variation in the published numbers out there.

- Kevin

-----Original Message-----
From: mems-talk-bounces@memsnet.org on behalf of Evelyn B
Sent: Sat 2/7/2009 4:47 PM
To: General MEMS discussion; Evelyn Benabe
Subject: [mems-talk] Resist 1813 post development bake

I have heard that for improved etch resistance 1813 resist should be
post-develop baked.  Does any one know the recommended post development bake
temperature and duration for 1813 resist?  I understand that both the
temperature and duration should be larger than that of the soft-bake.