Hello all,

Apologies for a vague question here but here it is anyway: What
photoresist is more resistant to dry etching - AZ4562 or SPR220-7?

I realize my question is far too simplistic as the selectivity will
depend on process gases, powers, pressures, resit processing (hard bake
etc.)........

Does anyone have any experience of the two photoresists?

Many thanks,

Dr. James Paul Grant
Postdoctoral Research Associate
Microsystems Technology Group
76 Oakfield Avenue Room 3
University of Glasgow
Glasgow
Scotland
G12 8LS

Telephone: +44(0)141 330 3374