Mr. Shile, thank you for your reply.

The ICP is used to etch a silicon layer of 60um (DRIE). The process is described
as follows. First, silicon is etched to define anchors. Secondly, glass and
silicon are bonded together. Then, ICP is used to define the movable structure.

--- Roger Shile  wrote：

> I think you need to describe a little more about the ICP
> process before
> this question can be answered.  ICP (Inductively Coupled
> Plasmas) are
> used for etching, plasma enhanced CVD and plasma emission
> spectrometers,
> among other diverse applications.
>
> Roger Shile